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Title:
培養装置および培養方法
Document Type and Number:
Japanese Patent JP7452384
Kind Code:
B2
Abstract:
A culture apparatus 10 that cultures a subject to be cultured by supplying moisture to the subject to be cultured includes a fine water generating cartridge 30 that is disposed in an air passage 21 by which moisture can be supplied into a culture space 51 and that goes into a moisture absorption state in which moisture in air is adsorbed on conductive polymer films 34b by reducing the temperature of a base material 34a having the conductive polymer films 34b, and goes into a moisture release state in which fine water with a particle size of 50 nanometers or less is released from the moisture adsorbed on the conductive polymer films 34b by increasing the temperature of the base material 34a; and a control part 60 that performs moisture absorption control in which the fine water generating cartridge 30 is brought into the moisture absorption state, and moisture release control in which the fine water released by bringing the fine water generating cartridge 30 into the moisture release state is supplied into the culture space 51, by which the subject to be cultured is irradiated with the fine water.

Inventors:
Yuki Tabata
Isao Ohtsubo
Akira Hirano
Application Number:
JP2020185897A
Publication Date:
March 19, 2024
Filing Date:
November 06, 2020
Export Citation:
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Assignee:
Aisin Co., Ltd.
International Classes:
C12M1/38; C12N1/14; C12N1/16; C12N1/20; C12N5/00
Domestic Patent References:
JP2020115765A
JP2005137273A
JP2006000054A
JP2013051941A
JP2001211874A
JP3201976A
JP2018054258A
Attorney, Agent or Firm:
Patent Attorney Corporation ITEC International Patent Office