To provide a CVD apparatus in which a raw material tank in a raw material solution supply unit can be efficiently and safely replaced.
In a raw material solution part having a tank outlet valve, a bypass line valve, an inert gas supply line valve, a discharge line valve, a raw material solution supply line valve and a solvent supply line valve, the tank outlet valve, the bypass line valve, the inert gas supply line valve and the raw material solution supply line valve are directly connected (without any branch pipes) to a linear main pipe perpendicularly extending upward from the solvent supply line valve toward the discharge line valve so that liquid remaining in a specific area surrounded by the tank outlet valve, the bypass line valve, the inert gas supply line valve, the discharge line valve, the raw material solution supply line valve and the solvent supply line valve is replaced by a solvent flowing from the lowermost solvent supply line valve toward the uppermost discharge line valve.
IKEDA MASAKIYO
YASUNAGA SHINYA
Yoshio Arafune