To provide porcelain for an upper layer capable of applying porcelain for the lower layer of a prosthesis using a frame to porcelain for the base material of the prosthesis not using the frame.
Since the one of a composition indicated in the table (4) is used as the porcelain for the upper layer, calcination is possible at a low temperature equal to or below a temperature higher than the softening point of press porcelain for a zirconia frame only by 100(°C), and the thermal expansion coefficient of the generated upper layer is almost the same as the thermal expansion coefficient of the base material. Thus, even during the calcination for forming the upper layer, the base material is not softened nor deformed and stress due to the difference of the thermal expansion coefficients to deform the base material is not generated.
COPYRIGHT: (C)2007,JPO&INPIT
Hajime Sakakibara
Shinichiro Kato
| JP2005537848A | ||||
| JP11021145A | ||||
| JP2005187436A | ||||
| JP63156036A | ||||
| JP2005034275A | ||||
| JP2001508464A | ||||
| JP2000139953A | ||||
| JP9110624A |