PURPOSE: To considerably decrease running cost by forming a deposited film forming device in such a manner that film formation on many pieces can be uniformly executed at one time in one device.
CONSTITUTION: The deposited film forming device 100 is constituted of a cylindrical base entrance and exit chamber 101, the 1st deposition chamber 102, the 2nd deposition chamber 103, and the 3rd deposition chamber 104 and the respective chambers are circularly disposed via gate valves 105aWd. Three pieces of the cylindrical bases 113 are set on a cylindrical base conveying base in the cylindrical base entrance and exit chamber 101, and after the entrance and exit chamber 101 is closed, the inside of the chamber is evacuated and the gate valve 105a is opened. Then bases 113 are conveyed into the chamber 102 and the gate valve 105a is closed. The cylindrical bases 113 are heated by IR lamps 112. A gaseous raw material is supplied from a pipe 108 and a gaseous halogen oxidizing agent is supplied from a pipe 107 into the deposition chamber 102 to form the 1st layer of the deposited film on the cylindrical base 113. The 2nd and 3rd layers are then formed in the 2nd deposition chamber 103 and the 3rd deposition chamber 104. The cylindrical bases are thereafter ejected from the entrance and exit chamber 101.
HIROOKA MASAAKI
HANNA JUNICHI
SHIMIZU ISAMU
