Title:
堆積装置、基板への堆積方法、基板構造及び基板支持体
Document Type and Number:
Japanese Patent JP7254206
Kind Code:
B2
Abstract:
A deposition apparatus includes a first substrate support for supporting a substrate in a substantially vertical orientation. The substrate has a first main surface, a second main surface opposite the first main surface and a side surface between the first main surface and the second main surface. The deposition apparatus includes a first deposition device for depositing a first conductive pattern or a first resist mask on the side surface of the substrate while the substrate is supported in the substantially vertical orientation by the first substrate support.
Inventors:
Antonioli, Francesca
Dakunzo, Marco
Gallizzo, Marco
Hada, Daniel
Dakunzo, Marco
Gallizzo, Marco
Hada, Daniel
Application Number:
JP2021555611A
Publication Date:
April 07, 2023
Filing Date:
March 19, 2019
Export Citation:
Assignee:
Applied Materials Italy S.R.L.
International Classes:
B41F15/08; B41F15/20; B41M1/12; H05K3/12; H05K3/18; H05K3/28
Domestic Patent References:
| JP59149086A | ||||
| JP5301334A | ||||
| JP55117185A | ||||
| JP58058796A | ||||
| JP7134559A | ||||
| JP10199887A | ||||
| JP58219751A | ||||
| JP637449A |
Foreign References:
| WO2010044257A1 | ||||
| US20120064728 |
Attorney, Agent or Firm:
Sonoda & Kobayashi Patent Attorneys Corporation
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