DEPOSITION PREVENTING MEMBER AND FILM DEPOSITION APPARATUS COMPRISING THE SAME AND MAINTENANCE METHOD OF DEPOSITION PREVENTING MEMBER

Japanese Patent JP2014141709

A

PROBLEM TO BE SOLVED: To provide a deposition preventing member in which a sediment formed from a deposit of particles of anti-corrosion metal for film forming may be removed easily.SOLUTION: Provided are tabular deposition preventing members 65-69 for preventing particles of anti-corrosion metal generated by sputtering, for example, in a film deposition apparatus 50 that are not used for a film deposition on a long resin film substrate F, a film deposited substrate from dispersing and depositing on other portion and cylindrical deposition preventing members 70-73 provided as necessary. Bodies of these deposition preventing members 65-73 are made of anti-corrosion material and their surfaces are covered with copper. When the maintenance is conducted, The deposit on the deposition preventing members 65-73 may be easily removed by detaching the deposition preventing members 65-73 from the film deposition apparatus 50, washing with an acid and further giving a mechanical impact by a shot-blasting and the like as necessary.

WO/2021/234030	TRANSPARENT ARTICLE, IN PARTICULAR A SPECTACLE LENS, WITH ANTIBACTERIAL AND/OR ANTIVIRAL PROPERTIES AND METHOD FOR MANUFACTURING THEREOF
JP2012207263	VAPOR DEPOSITION METHOD, AND VAPOR DEPOSITION APPARATUS
JP6871068	Sputtering equipment

KAWAMURA YASUSHI

JP2013010674A

August 07, 2014

January 23, 2013

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SUMITOMO METAL MINING CO

C23C14/00

JPH01159368A	1989-06-22
JPH0649626A	1994-02-22
JPH11124661A	1999-05-11
JPH04120266A	1992-04-21
JPH03162575A	1991-07-12
JP2002356765A	2002-12-13
JP2001247957A	2001-09-14
JP2010229434A	2010-10-14
JPH01159368A	1989-06-22

Noriyuki Tsujikawa
Masao Yamamoto

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