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Title:
DETECTION OF DEFECTS ON PATTERNED SEMICONDUCTOR SUBSTRATE
Document Type and Number:
Japanese Patent JP2000208576
Kind Code:
A
Abstract:

To minimize the time overhead for mechanical X-Y stage movement.

In this defect detecting method, defects on a substrate are detected by a process for positioning an charged particle beam optical column 600, which has a field of view(FOV) with a resolution practically uniform over the entire column, with respect to a patterned substrate 622, a process for scanning the substrate while maintaining the optical charged particle beam column at a fixed position on the substrate, so as to capture images on the plural small areas of the substrate inside the FOV and a process for comparing the captured images with a reference image. By utilizing a large FOV image formation system, having the FOV with the resolution practically uniform all over the system, images can be captured over a wide range of the substrate without, requiring the movement of a mechanical X-Y stage 632 and time overhead for the mechanical stage movement can be reduced. In order to improve the throughput, plural columns may be linked as well.


Inventors:
TALBOT CHRISTOPHER G
LO CHIWOEI WAYNE
Application Number:
JP2000002029A
Publication Date:
July 28, 2000
Filing Date:
January 07, 2000
Export Citation:
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Assignee:
SCHLUMBERGER TECHNOLOGIES INC
International Classes:
G01B15/00; G01N21/00; G01N23/00; G01N23/04; G01N23/225; G01Q30/04; G01Q40/02; G01R1/06; G01R31/265; G01R31/302; G01R31/305; H01J37/073; H01J37/20; H01J37/22; H01J37/256; H01J37/28; H01L21/66; (IPC1-7): H01L21/66; H01J37/28; H01J37/22; H01J37/20; H01J37/073; G01R31/302; G01R1/06; G01B15/00
Domestic Patent References:
JPH0249339A1990-02-19
JPH02281612A1990-11-19
JPH10185847A1998-07-14
JPH10318950A1998-12-04
JPH08195339A1996-07-30
JPH07135244A1995-05-23
JPH09184715A1997-07-15
JP2685501B21997-12-03
JPH05101166A1993-04-23
Attorney, Agent or Firm:
Uchihara Shin