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Title:
DEVELOPER FOR PHOTORESIST, DEVELOPING METHOD WITH THE DEVELOPER, STAMPER FORMED WITH THE DEVELOPER, SUBSTRATE AND OPTICAL DISK
Document Type and Number:
Japanese Patent JPH02201447
Kind Code:
A
Abstract:

PURPOSE: To enhance the yield of development and to improve the performance of a stamper formed by development and that of a substrate or an optical disk by improving the wettability of the surface of a resist with a developer and enabling uniform development.

CONSTITUTION: A substrate for an optical disk and the optical disk are formed with a stamper formed with a developer contg. an anionic surfactant and spreading on a resist coated surface to be developed within 0.1sec. When the stamper has a group part 1 and a center hole 2, the substrate has a part 3 to be transferred from the group part 1 and a center hole 4. Since the wettability of the surface of the resist with the developer is improved and uniform development is enabled, the yield of development is enhanced and the performance of the stamper formed by development and that of the substrate or the optical disk are improved.


Inventors:
YATAKE MASAHIRO
Application Number:
JP2151289A
Publication Date:
August 09, 1990
Filing Date:
January 31, 1989
Export Citation:
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Assignee:
SEIKO EPSON CORP
International Classes:
G03F7/32; B29C33/38; B29D17/00; G11B7/26; (IPC1-7): B29C33/38; B29D17/00; G03F7/32; G11B7/26
Attorney, Agent or Firm:
Masanori Ueyanagi (1 outside)



 
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