Title:
DEVELOPING METHOD AND DEVELOPING APPARATUS
Document Type and Number:
Japanese Patent JP3894104
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To maintain uniformity of development even when a developer solution is reused many times in the developing process.
SOLUTION: In the concentration measuring unit 222, a part of a developer solution in a preparation tank 186 is sampled, the concentration of the resist is measured by absorptiometry, and the measurement result (the measured concentration of the resist) is sent to a controlling unit 240. The controlling unit 240 controls opening/closing valves 210, 212, 216 of a TMAH (tetramethyl ammonium hydroxide) source liquid supply pipe 200, a solvent supply pipe 204 and a drain pipe 208, respectively, and adjusts the components of the developer solution so that the TMAH concentration in the developer solution in the preparation tank 186 is controlled to a value corresponding to the measured resist concentration to maintain the development rate constant. The developer solution transferred from the preparation tank 186 to a supply tank 188 is sent to a developer solution nozzle DN of a developing unit 126 by driving of a pump 228 through the developer solution supply pipe 224.
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Inventors:
Kiyohisa Tateyama
Masafumi Nomura
Taketora Shinoki
Masafumi Nomura
Taketora Shinoki
Application Number:
JP2002332578A
Publication Date:
March 14, 2007
Filing Date:
November 15, 2002
Export Citation:
Assignee:
東京エレクトロン株式会社
International Classes:
G03F7/26; G03F7/30; G03D3/06; H01L21/027; H01L21/00; (IPC1-7): G03F7/26; G03F7/30; H01L21/027
Domestic Patent References:
| JP7110580A | ||||
| JP2001332469A | ||||
| JP8278635A | ||||
| JP2002196503A | ||||
| JP9269320A |
Attorney, Agent or Firm:
Filial piety Sasaki