PURPOSE: To enable both of negative and positive type PS plates to be satisfactorily processed in common with the same developing solution by incorporating at least one of specified compounds and at least one of sulfite and an anionic surfactant in a developing solution composition.
CONSTITUTION: The developing solution composition contains at least one of the sulfite and the anionic surfactant, and at least one of the compounds represented by formula IWV in which each of R1WR3 is H, 1W4 C alkyl or such alkoxy, and R'3 is 1W4 C alkyl or such alkoxy. This compound is exemplified by propylene glycol α-monomethyl benzyl ether. The developing solution composition is an aqueous alkaline solution having, preferably, a pH of 11.8W13.0 when it is used.
UEHARA MASABUMI
KIYONO MINORU
NAKANO MIEHARU
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