Title:
DEVELOPING SOLUTION FOR POSITIVE TYPE RESIST
Document Type and Number:
Japanese Patent JPH02160246
Kind Code:
A
Abstract:
PURPOSE: To stably form a resist pattern high in contrast by adding an alkali- soluble cyclic nitrogen compound in an aqueous organic alkaline solution.
CONSTITUTION: It is preferred to use as the aqueous organic alkaline solution the one containing tetramethyl ammonium hydroxide or/and choline in a concentration of, usually, 1.0 - 10wt.%, preferably, 1.5 - 7.5wt.%, and the alkali-soluble cyclic nitrogen compound is added to the solution in an amount of, usually, 0.1 - 10wt.%, preferably, 0.3 - 5.0wt.% of the solution, thus permitting contrast to be enhanced, accordingly, a resist pattern extremely good in the sectional form to be formed.
Inventors:
TAKEDA YASUYUKI
TANAKA HATSUYUKI
NAKAYAMA TOSHIMASA
TANAKA HATSUYUKI
NAKAYAMA TOSHIMASA
Application Number:
JP14312689A
Publication Date:
June 20, 1990
Filing Date:
June 07, 1989
Export Citation:
Assignee:
TOKYO OHKA KOGYO CO LTD
International Classes:
G03F7/32; H01L21/027; (IPC1-7): G03F7/32
Domestic Patent References:
| JPS5730832A | 1982-02-19 | |||
| JPS60179738A | 1985-09-13 | |||
| JPS6472155A | 1989-03-17 |
Attorney, Agent or Firm:
Akira Agata (2 outside)
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