PURPOSE: To eliminate unequal development by supplying a developer at a relatively high speed in a relatively small amt. in a 1st stage and in a large amt. by rotation at the speed relatively lower than the speed of the 1st stage in a 2nd stage.

CONSTITUTION: While a substrate W held by a spin chuck 2 is kept rotated at the relatively high speed, the developer 5 is supplied by the continuous flow of a relatively small flow rate onto the surface of the photoresist of this substrate in the 1st stage. As a result, the developer 5 is spread over the entire surface of the substrate W by strong centrifugal force and the surface of the photoresist film adapts itself to the developer. The developer 5 is supplied by the continuous flow of the relatively large flow rate onto the surface of the photoresist film while the substrate W is kept rotated at a low speed or stopped in rotation in the 2nd stage. In succession, the supply of the developer 5 is supplied and the spin chuck 2 is rotated at the lower ratio or the state of stopping the chuck is maintained in the next developer holding stage. As a result, the developer 5 maintains the state of forming meniscus on the surface of the photoresist film of the substrate W by its surface tension.