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Title:
DEVICE FOR APPLYING PHOTOSENSITIVE AGENT
Document Type and Number:
Japanese Patent JP3432872
Kind Code:
B2
Abstract:

PURPOSE: To uniformly apply a photoresist on a glass master desk by circularly applying the photoresist on the inner circumference of the glass master disk while keeping the disk in a static state and then scattering the photoresist by the high-speed rotation of the disk in a device for applying a photosensitive agent such as a photoresist so as to produce an optical disk medium.
CONSTITUTION: A photoresist 9 is circularly dropped on the inner circumference of a static glass master disk 5 from a dropping nozzle 8B. The flow rate of dropping of the photoresist is measured with a flowmeter 16 and controlled by opening or closing a solenoid valve 10 through a control system 17.


Inventors:
Yoshiaki Maeno
Masahiro Higuchi
Application Number:
JP31040393A
Publication Date:
August 04, 2003
Filing Date:
December 10, 1993
Export Citation:
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Assignee:
Sanyo Electric Co., Ltd.
International Classes:
G11B7/26; (IPC1-7): G11B7/26
Domestic Patent References:
JP5234152A
JP4102245A
Attorney, Agent or Firm:
Masamasa Shibano