Title:
DEVICE FOR CONTROLLING RESIST PEELING LIQUID
Document Type and Number:
Japanese Patent JP3093975
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To automatically control resist peeling liquid to a specified water concentration and dissolution resist concentration by detecting water concentration of the resist peeling liquid in a resist peeling treatment vessel with an absorptiometer, and refilling at least resist peeling stock solution or pure water.
SOLUTION: The dissolution resist concentration of resist peeling liquid is detected with a absorptiometer 16, and a resist peeling stock solution and a pure water are refilled. At normal state, a liquid level is near a weir position for over-flow, and when at least the resist peeling stock solution or pure water is refilled, a degraded resist peeling liquid is overflown and automatically discharged from the water for overflow. A discharge pump 18 is not always required, a valve may be assigned instead of the discharge pump 18. Thereby, the resist peeling liquid is automatically controlled to a specified water concentration and dissolution resist concentration, and appropriate control can be performed on liquid refilling for a resist peeling treatment vessel.
Inventors:
Toshimoto Nakagawa
Kozo Tsukada
Osamu Ogawa
Takahiro Hozan
Yoshitaka Nishijima
Kozo Tsukada
Osamu Ogawa
Takahiro Hozan
Yoshitaka Nishijima
Application Number:
JP19300596A
Publication Date:
October 03, 2000
Filing Date:
July 02, 1996
Export Citation:
Assignee:
Hirama Rika Laboratory Co., Ltd.
Nagase & Co., Ltd.
Nagase & Co., Ltd.
International Classes:
G03F7/42; G05D11/13; H01L21/027; H01L21/306; (IPC1-7): H01L21/306; G03F7/42; H01L21/027
Domestic Patent References:
| JP7235487A |
Attorney, Agent or Firm:
Shinichi Shiode (1 person outside)