To provide an EB drawing device in which the image of a first aperture can be formed on a second forming aperture mask accurately.
The EB drawing device comprises a first forming aperture mask containing the first aperture for forming an EB, a deflecting means which is formed by the first aperture for deflecting the EB containing the image of the first aperture, the second forming aperture mask for forming the deflected EB, a projection lens for forming the image of the first aperture on the second forming aperture mask, a deflection focus of the image of the first aperture which is provided in the second forming aperture mask and is scanned by the deflected EB to form an image on the second forming aperture mask, a test mark for testing a deflection non-point, a detecting means for detecting an intensity profile of the EB which has scanned the test mark, an amount of the deflection focus based on the intensity profile, a calculating means for calculating an amount of the deflection non-point, and a correcting means for correcting the deflection focus and the deflection non-point based on the amount of the deflection focus and the amount of the deflection non-point.
Satoshi Kono
Makoto Nakamura
Kurata Masatoshi
Takashi Mine
Yoshihiro Fukuhara
Sadao Muramatsu
Ryo Hashimoto