Title:
DEVICE, PLANT FACILITY, DEVICE CONTROL METHOD, PROGRAM, PLANT SYSTEM, AND PLANT SYSTEM CONTROL METHOD
Document Type and Number:
Japanese Patent JP2022029439
Kind Code:
A
Abstract:
To accurately calculate a control target value of a control parameter based on an operation parameter, even when an operation condition for a plant instrument is changed.SOLUTION: A control device of a plant instrument comprises a control part and a function updating part. The control part determines a control target value of a control parameter corresponding to a first operation parameter using function, and controls the plant instrument so that the control parameter is equal to the control target value. The function updating part updates the function on the basis of a deviation between an actual measured value and a target value of an operation state parameter of the plant instrument. Further the function updating part updates the function by adding a bias value to the control target value of the control parameter, in an area including the actual measured value of the first operation parameter, of a plurality of areas defined based on a value of the first operation parameter of the function.SELECTED DRAWING: Figure 2
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Inventors:
MIZOWAKI YUTAKA
TAKAYAMA KOJI
UEDA YUYA
TAKAYAMA KOJI
UEDA YUYA
Application Number:
JP2021127111A
Publication Date:
February 17, 2022
Filing Date:
August 03, 2021
Export Citation:
Assignee:
MITSUBISHI POWER LTD
International Classes:
B02C15/04; B02C25/00; F23K3/02; G05B11/36
Attorney, Agent or Firm:
Seishin ip patent business corporation