Title:
DEVICE FOR PROJECTION AND EXPOSURE
Document Type and Number:
Japanese Patent JPS5740926
Kind Code:
A
Abstract:
PURPOSE:To simplify the inspection process for the subject device by a method wherein, when the image drawn on a glass plate is transferred using a reduced exposing device, the dust adhereon on the glass is comparatively inspected with the reference pattern and it is detected and removed. CONSTITUTION:The first pattern 101 is provided on a reticle 102 to be actually used. Now, let it be supposed that dust 103 is adhered on the reticle 102. Another dustless reticle 104 is provided as the second reference pattern. The reticle 102 is set on a reduced projecting and exposing device, and the superposed image of these two patterns 101 and 105 are observed. As the dust 103 can be found as dust 107, the reticle is cleaned by stopping the transferring exposure. Through these procedures, the reticle inspection process can be simplified and also the misjudgement wherein all wafers are considered to be defective can be prevented.
Inventors:
YAMANAKA YOUJI
YAMAMOTO HIROHIKO
YAMAMOTO HIROHIKO
Application Number:
JP11739280A
Publication Date:
March 06, 1982
Filing Date:
August 26, 1980
Export Citation:
Assignee:
NIPPON ELECTRIC CO
International Classes:
H01L21/66; G03F1/00; H01L21/027; (IPC1-7): H01L21/30
Domestic Patent References:
| JPS4980976A | 1974-08-05 | |||
| JPS5333029A | 1978-03-28 | |||
| JPS5143958A | 1976-04-15 | |||
| JPS5324780A | 1978-03-07 |