Title:
広角イオンビームのための抽出アセンブリを備えた装置およびシステム
Document Type and Number:
Japanese Patent JP7330361
Kind Code:
B2
Abstract:
An ion beam processing apparatus may include a plasma chamber, and a plasma plate, disposed alongside the plasma chamber, where the plasma plate defines a first extraction aperture. The apparatus may include a beam blocker, disposed within the plasma chamber and facing the extraction aperture. The apparatus may further include a non-planar electrode, disposed adjacent the beam blocker and outside of the plasma chamber; and an extraction plate, disposed outside the plasma plate, and defining a second extraction aperture, aligned with the first extraction aperture.
Inventors:
Biroiu, Costel
Thomas, Ap Naveen
Rockwell, Tyler
Sinclair, Frank
Campbell, Christopher
Thomas, Ap Naveen
Rockwell, Tyler
Sinclair, Frank
Campbell, Christopher
Application Number:
JP2022505422A
Publication Date:
August 21, 2023
Filing Date:
June 23, 2020
Export Citation:
Assignee:
APPLIED MATERIALS,INCORPORATED
International Classes:
H01J37/08; H01J37/305; H05H1/30
Domestic Patent References:
| JP2017510932A | ||||
| JP2017533542A |
Foreign References:
| US20150325411 | ||||
| US20170178866 |
Attorney, Agent or Firm:
Sonoda & Kobayashi Patent Attorneys Corporation