Title:
DEVIDING PRINTER
Document Type and Number:
Japanese Patent JPS5998525
Kind Code:
A
Abstract:
PURPOSE:To detect a difference of positions of a mask and a wafer and to move them for correction by one of a binocular microscope as well as to confirm an absolute position variation of the mask by another microscope outside of a path of an exposure light by arranging the one of the binocular microscope inside of the path of the exposure light and another outside of the path. CONSTITUTION:A mask side alignment mark 8 and a wafer side alignment mark 9' which are observed by an objective 1 of an alignment microscope are arranged inside of a path of an exposure light. Meanwhile, a mask reference mark 6' and a mask side alignment mark 7' which are observed by an objective 1' of the alignment microscope are arranged outside of the path. A mark 8 is composed of two pair of parallel lines which are facing obliquely each other, marks 8a-8d. A mark 9' is composed of two oblique lines facing each other, marks 9a and 9b. These marks are scanned by laser scanning beam L1 and L2 respectively, thereby detecting a difference of alignment photoelectrically. A mask stage is slightly moved in X direction and Y direction so as to correct this difference DELTA. At this time, the objective 1' confirms relative position variation of the mask and the wafer.
Inventors:
TAKAHASHI KAZUO
SATOU HIROSHI
KOSUGI MASAO
SATOU HIROSHI
KOSUGI MASAO
Application Number:
JP20720782A
Publication Date:
June 06, 1984
Filing Date:
November 26, 1982
Export Citation:
Assignee:
CANON KK
International Classes:
G03F7/20; G03F9/00; G05D3/12; H01L21/027; G03B27/32; H01L21/30; H01L21/68; (IPC1-7): G03B27/32; G03F7/20; G03F9/00; G05D3/00
Domestic Patent References:
| JPS57138134A | 1982-08-26 | |||
| JPS57142612A | 1982-09-03 | |||
| JPS583227A | 1983-01-10 |
Attorney, Agent or Firm:
Marushima Giichi