Title:
DIHYDRODISILOXANE COMPOUND AND PRODUCTION METHOD THEREOF
Document Type and Number:
Japanese Patent JP2022151955
Kind Code:
A
Abstract:
To provide: a silicon-based compound which exhibits high vaporization properties and is useful as a precursor for making a silica thin film with a good deposition rate by a CVD method; and a production method thereof.SOLUTION: A dihydrodisiloxane compound is represented by general formula (1) in the figure, where R1 represents a C1-6 alkyl group and R2 represents a C1-3 alkyl group, provided that the sum of the numbers of carbon atoms in one R1 group and one R2 group is from 4 to 9 inclusive.SELECTED DRAWING: None
Inventors:
TANAKA RYOJI
FUKAWA MARINA
SUGIMOTO SHUN
FUKAWA MARINA
SUGIMOTO SHUN
Application Number:
JP2021054525A
Publication Date:
October 12, 2022
Filing Date:
March 29, 2021
Export Citation:
Assignee:
TOSOH CORP
SAGAMI CHEM RES INST
SAGAMI CHEM RES INST
International Classes:
C07F7/18