Title:
希釈薬液製造装置及び希釈薬液製造方法
Document Type and Number:
Japanese Patent JP6819175
Kind Code:
B2
Abstract:
A dilute chemical solution producing apparatus includes, in a supply line of ultrapure water, a platinum group metal carrying resin column, a membrane-type deaeration apparatus, and a gas dissolving membrane apparatus, and a washing chemical solution injection apparatus is provided between the platinum group metal carrying resin column and the membrane-type deaeration apparatus. An inert gas source is connected to a gas phase side of the membrane-type deaeration apparatus, and an inert gas source is also connected to a gas phase side of the gas dissolving membrane apparatus. A discharge line communicates with the gas dissolving membrane apparatus. With such a dilute chemical solution producing apparatus, a dilute chemical solution with both dissolved oxygen and dissolved hydrogen peroxide being removed can be safely produced and supplied in a washing step for semiconductor washing.
Inventors:
Yu Fujimura
Face nobuko
Hiroto Tokoshima
Face nobuko
Hiroto Tokoshima
Application Number:
JP2016183087A
Publication Date:
January 27, 2021
Filing Date:
September 20, 2016
Export Citation:
Assignee:
Kurita Water Industries Ltd.
International Classes:
C02F1/68; B01D19/00; B01F1/00; B01F5/06; B01J23/42; B08B3/08; C02F1/20; C02F1/58; H01L21/304
Domestic Patent References:
| JP2004340304A | ||||
| JP2010069460A | ||||
| JP4176303A | ||||
| JP2003062403A | ||||
| JP2002307080A | ||||
| JP2015088740A | ||||
| JP2000208471A | ||||
| JP2011036807A |
Foreign References:
| WO2015189933A1 | ||||
| WO2015045975A1 |
Attorney, Agent or Firm:
Yuji Hayakawa
Keisuke Murasame
Keisuke Murasame