PURPOSE: To enable precise discrimination of a pattern edge regardless of a beam diameter and beam energy distribution by providing a electron irradiating means for irradiating and scanning a sample, on which a pattern to be measured is formed, with an electron beam and a transmitted electron detecting means for measuring the electron beam intensity transmitted through said sample.
CONSTITUTION: When pitch spacings of mask patterns 172, 173 in the X-direction are measured, a stage is moved in the X-direction by an X-direction stage driving mechanism, and at that time, the stage position in the X-direction and the signal magnitude of high energy transmitted electrons from a connector 23 are simultaneously measured. The stage position is measured by laser interferometers 14, 13, The signal magnitude and the position data are digitized and are stored in a measuring microcomputer 30 so that the position data and signal magnitude data are correspond to each other. Then, the data, for which the signal magnitude is 1/2 of the maximum value, is retrieved and the position data corresponding to that data is extracted. This corresponds to the pattern edge position.
GOTO SUSUMU
KARIYA TAKUO
UZAWA SHUNICHI
| JPH01243421A | 1989-09-28 | |||
| JPH02202010A | 1990-08-10 |