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Title:
DIPPING PROCESSOR, DIPPING PROCESSING METHOD, MANUFACTURING METHOD FOR ELECTRO-OPTICAL DEVICE, THE ELECTRO-OPTICAL DEVICE AND ELECTRONIC EQUIPMENT
Document Type and Number:
Japanese Patent JP2002280345
Kind Code:
A
Abstract:

To provide a dipping processor provided with a cassette which withstands even the liquid mixture of concentrated sulfuric acid and hydrogen peroxide water, without generating drying unevenness at pulling up of a planar work at a rate, at which stuck processing liquid, such as warm water can be evaporated and dried after dipping it in the processing liquid, dipping processing method, and to provide the manufacturing method of an electro-optical device, the electro-optical device manufactured by the manufacturing method and electronic equipment.

In this dipping processor for pulling up the cassette 200 at the speed, at which the warm water stuck to an element substrate 20 can be evaporated and dried before it is completely pulled up from the warm water, the cassette 200 is provided with a plurality of horizontal side support shafts 210, extended in a horizontal direction so as to respectively support the side end part of the element substrate 20 on both sides of the erected element substrate 20. The horizontal side support shafts 210 are provided with a plurality of panel guide parts 220 expanded toward the element substrate 20, and the surface of the panel guide part 220 is made of ceramics such as hydrophilic glass among the various kinds of oxidation resistant materials.


Inventors:
IWATA SHINICHI
Application Number:
JP2001078899A
Publication Date:
September 27, 2002
Filing Date:
March 19, 2001
Export Citation:
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Assignee:
SEIKO EPSON CORP
International Classes:
G02F1/13; B08B3/04; B08B3/08; G02F1/1365; H01L21/304; H01L21/673; H01L21/68; (IPC1-7): H01L21/304; B08B3/04; B08B3/08; G02F1/13; G02F1/1365; H01L21/68
Attorney, Agent or Firm:
Masanori Ueyanagi (1 outside)