Title:
Direct application of dampening fluid for variable data lithography equipment
Document Type and Number:
Japanese Patent JP6321859
Kind Code:
B2
Abstract:
A system and corresponding methods are disclosed for applying a dampening fluid to a reimageable surface of an imaging member in a variable data lithography system, without a form roller. In one embodiment, the system includes subsystems (30) for converting a dampening fluid from a liquid phase to a dispersed fluid phase, and for directing flow of a dispersed fluid comprising the dampening fluid in dispersed fluid phase to the reimageable surface (12). The dampening fluid reverts to the liquid phase directly on the reimageable surface. In another embodiment a continuous ribbon of dampening fluid may be applied directly to the reimageable surface. This embodiment includes a body structure having a port for delivering dampening fluid in a continuous fluid ribbon directly to the reimageable surface, and a mechanism, associated with the body structure, for stripping an entrained air layer over the reimageable surface when the reimageable surface is in motion.
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Inventors:
Timothy Dee Stow
Ashish Patcar
Eric Peters
David Kay Biegersen
Lars-Eric Schwartz
Yogan H Daniel
Ashish Patcar
Eric Peters
David Kay Biegersen
Lars-Eric Schwartz
Yogan H Daniel
Application Number:
JP2017104416A
Publication Date:
May 09, 2018
Filing Date:
May 26, 2017
Export Citation:
Assignee:
Palo Alto Research Center Incorporated
International Classes:
B41F7/24; B41F7/30; B41F7/32; B41M1/06
Domestic Patent References:
| JP63165143A | ||||
| JP52132909A | ||||
| JP64027943A | ||||
| JP3175038A |
Foreign References:
| US20100031838 |
Attorney, Agent or Firm:
Atsushi Nakajima
Kato Kazunori
Kato Kazunori
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