Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
露光用放電励起レーザ装置
Document Type and Number:
Japanese Patent JP5439530
Kind Code:
B2
More Like This:
JP2009021496EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD
JP4439915A bisimide compound, an acid generator using the bisimide compound, a resist composition, and a pattern forming method using the composition.
JP2755151MANUFACTURE OF SEMICONDUCTOR
Inventors:
Wakabayashi Osamu
Application Number:
JP2012067786A
Publication Date:
March 12, 2014
Filing Date:
March 23, 2012
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
Gigaphoton Co., Ltd.
International Classes:
H01L21/027; G03F7/20; H01S3/00; H01S3/23
Domestic Patent References:
JP9214023A
JP5275317A
JP11087825A
JP2008103604A
JP2006024855A
Attorney, Agent or Firm:
Hiroaki Sakai



 
Previous Patent: JPS5439529

Next Patent: INPUT AND OUTPUT PORT CIRCUIT