Title:
DISPLACEMENT SUPPRESSION DEVICE, BASE ISOLATION SYSTEM AND NEGATIVE RESTORING FORCE MECHANISM
Document Type and Number:
Japanese Patent JP2019163799
Kind Code:
A
Abstract:
To provide a displacement suppression device capable of easily restoring an object to an initial position.SOLUTION: A displacement suppression device 9 that suppresses the displacement u of a base isolation object 103 with respect to a support structure 101, comprises a positive restoring force mechanism 11 and a negative restoring force mechanism 13. The positive restoring force mechanism 11 generates a restoring force depending on the displacement u, has a positive spring characteristic for the restoring force, and applies the restoring force to the base isolation object 103. The negative restoring force mechanism 13 generates a restoring force depending on the displacement u, has a negative spring characteristic for the restoring force, and applies the restoring force to the base isolation object 103 in parallel with the positive restoring force mechanism 11. Also, the negative restoring force mechanism 13 increases an absolute value |k| of a rate of change of the restoring force with respect to the displacement u as the displacement u increases.SELECTED DRAWING: Figure 1
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Inventors:
SAITO MASATO
SANDIA NEPAL
MURAI KAZUO
SANDIA NEPAL
MURAI KAZUO
Application Number:
JP2018051224A
Publication Date:
September 26, 2019
Filing Date:
March 19, 2018
Export Citation:
Assignee:
UNIV SAITAMA
SHODEN CORP
SHODEN CORP
International Classes:
F16F15/04; E04H9/02; F16F3/04
Domestic Patent References:
| JP2017187093A | 2017-10-12 |
Attorney, Agent or Firm:
Yasuhiro Iijima