Title:
DISSOLUTION RATE MODIFIER FOR PHOTORESIST COMPOSITION
Document Type and Number:
Japanese Patent JP2011008292
Kind Code:
A
Abstract:
To provide a dissolution rate modifier.
The present invention relates to oligomers of polycyclic olefin monomers, and optionally allylic or olefinic monomers, and a method of making the oligomers, including reacting polycyclic olefin monomers in the presence of a Ni or Pd containing catalyst, or in the case of allylic monomers, in the presence of a free radical initiator. The oligomers can be included in photoresist compositions as dissolution rate modifiers. The photoresist compositions can further includes a polymeric binder resin, a photoacid generator, and solvents.
Inventors:
RHODES LARRY F
SEGER LARRY
GOODALL BRIAN L
MCINTOSH LESTER H III
DUFF ROBERT J
SEGER LARRY
GOODALL BRIAN L
MCINTOSH LESTER H III
DUFF ROBERT J
Application Number:
JP2010202982A
Publication Date:
January 13, 2011
Filing Date:
September 10, 2010
Export Citation:
Assignee:
PROMERUS LLC
International Classes:
G03F7/004; C07C29/44; C07C31/44; C08F20/22; C08F32/08; C09K3/00; G03C1/76; G03F7/038; G03F7/039; G03F7/085; H01L21/027; C07B61/00; G03F
Attorney, Agent or Firm:
Shinjiro Ono
Kazuo Shamoto
Yasushi Kobayashi
Akio Chiba
Hiroyuki Tomita
Takumi Terachi
Kazuo Shamoto
Yasushi Kobayashi
Akio Chiba
Hiroyuki Tomita
Takumi Terachi
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