Title:
DRAWING APPARATUS, DRAWING SYSTEM AND DRAWING METHOD
Document Type and Number:
Japanese Patent JP2022097979
Kind Code:
A
Abstract:
To provide a drawing apparatus, a drawing system and a drawing method capable of drawing with high accuracy without complicatedly adjusting a focus of an optical system, on a surface having a shape having a height exceeding a focus depth.SOLUTION: A substrate W can be placed on a stage 10. A drawing head 402 includes a space light modulator 441 generating modulated light and a projection optical system 45 focusing the modulated light at a focusing position in a height direction on the stage 10. A moving portion 20 relatively moves the stage 10 and the drawing head 402 in a horizontal direction. A controller 60 controls the moving portion 20 and the drawing head 402. The controller 60 controls the space light modulator 441 based on correction pattern data expressing a correction pattern PC, the correction pattern data is generated by correcting design pattern data expressing a design pattern PD based on surface profile data expressing a surface profile of the substrate W.SELECTED DRAWING: Figure 1
More Like This:
Inventors:
MAJIMA SHOTA
Application Number:
JP2020211277A
Publication Date:
July 01, 2022
Filing Date:
December 21, 2020
Export Citation:
Assignee:
SCREEN HOLDINGS CO LTD
International Classes:
G03F7/20
Attorney, Agent or Firm:
Hidetoshi Yoshitake
Takahiro Arita
Takahiro Arita
Previous Patent: Positioning and locking device for scaffolding plates in temporary scaffolding
Next Patent: Golf ball
Next Patent: Golf ball