Title:
DRESSING METHOD FOR INNER PERIPHERAL BLADE IN SEMICONDUCTOR WAFER CUTTING DEVICE
Document Type and Number:
Japanese Patent JP11010538
Kind Code:
A
Abstract:
To establich a method to dress an inner peripheral blade in a wafer cutting device and capable of dressing without requiring a special holding mechanism to carry out dressing and accordingly without suspending wafer cutting.
A reinforced part 2 of thermosetting resin provided on an outer peripheral edge of a wafer 1 is formed by crushing a grindstone formed by baking a resin or glassy binder by abrasive grains of the number selected from grain sizes #320-#800 in less than 0.8 mm in the maximum diameter and mixing 4%-20% of it in volume, and an inner peripheral blade is devised to be dressed for each cutting by cutting the formed reinforced part with cutting of the wafer 1.
Inventors:
Sato, Shigeki
Sato, Tsutomu
Sato, Tsutomu
Application Number:
JP1997000159708
Publication Date:
January 19, 1999
Filing Date:
June 17, 1997
Export Citation:
Assignee:
NAOETSU DENSHI KOGYO KK
International Classes:
B24B53/00; B24B53/00; (IPC1-7): B24B53/00
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