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Patent Searching and Data


Title:
DRY FILM RESIST
Document Type and Number:
Japanese Patent JPH0452645
Kind Code:
A
Abstract:

PURPOSE: To improve the embedding property of a dry film resist by providing a foaming layer expanded by heating on a resist layer.

CONSTITUTION: This dry film resist is provided with the foaming layer 10 and a release layer 11 between a base film 1 and the resist layer 2. The layer 10 is formed of a mixture composed of a soft acrylic resin as a base material and a foaming agent. A protective film 3 is first stripped, then the layer 2 side is superposed on an object and is press welded to the object by a heat roll. The foaming agent in the layer 10 is expanded by the heat applied at this time, by which the layer 2 is pressed to the surface of the object. The layer 2 is closely stuck to the surface of the object in follow up to the surface of the object.


Inventors:
SUGI KOICHIRO
SATO YASUMASA
Application Number:
JP16185790A
Publication Date:
February 20, 1992
Filing Date:
June 20, 1990
Export Citation:
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Assignee:
MITSUBISHI RAYON CO
International Classes:
G03F7/004; G03F1/00; G03F1/68; H01L21/027; H05K3/28; (IPC1-7): G03F1/08; G03F7/004; H01L21/027; H05K3/28
Attorney, Agent or Firm:
Masatake Shiga (2 outside)