Title:
乾燥装置及び乾燥処理方法
Document Type and Number:
Japanese Patent JP6878557
Kind Code:
B2
Abstract:
To reduce effects of moisture mixed into a treatment container as much as possible when drying an organic material film on a substrate.SOLUTION: A drying device 100 includes: a treatment container 1 that enables vacuuming; and a substrate support section 3 serving as a substrate support section for supporting a substrate S in the treatment container 1. During drying treatment, when the pressure in the treatment container 1 is from atmospheric pressure to 500 Pa, the substrate S is held at a first height position, and when the pressure in the treatment container 1 is equal to or lower than 3 Pa, the substrate S is lowered to a second height position that is lower than the first height position. By performing decompression exhaust while the substrate S is held at the first height position, moisture in the treatment container 1 can be promptly discharged from an exhaust port 11a of a bottom wall 11.SELECTED DRAWING: Figure 1
Inventors:
Akinori Shimamura
Teruyuki Hayashi
Teruyuki Hayashi
Application Number:
JP2019232727A
Publication Date:
May 26, 2021
Filing Date:
December 24, 2019
Export Citation:
Assignee:
東京エレクトロン株式会社
International Classes:
F26B5/04; F26B25/00; H01L51/50; H05B33/10
Domestic Patent References:
| JP2014026764A | ||||
| JP2014186868A | ||||
| JP2009117568A |
Attorney, Agent or Firm:
Kazuhiro Watanabe
Noboru Tajime
Tajime Keiko
Taji U.S. Patent Office
Noboru Tajime
Tajime Keiko
Taji U.S. Patent Office