Title:
CHARGED PARTICLE BEAM LITHOGRAPHY METHOD
Document Type and Number:
Japanese Patent JP3195691
Kind Code:
B2
Abstract:
PURPOSE: To provide a charged particle beam lithography method which carries out graphic division that enables a graphic plotting faithful to an input graphic can be obtained, dividing it into pieces.
CONSTITUTION: The sides of a source graphic not parallel to an X axis or a X axis are obtained, and right-angled triangles each possessed of two sides parallel to an X axis or a Y axis and a residual side not parallel to an X axis or a Y axis as a hypotenuse are separated from the source graphic. The residual graphic is divided into rectangles by straight lines drawn in parallel with an X axis or a Y axis from the corners. The sides of the separated right-angled rectangle are compared with each other in length, whereby the shorter side is defined as a 'base', and the longer side is defined as a 'height'. All the source figures are retrieved, when it is found that the side of the divided rectangle is equal to the 'height', the right-angled triangle and the rectangle are joined together to form a trapezoid. When a rectangle possessed of the 'height' in common and a contained side and a trapezoid or a right-angled triangle possessed of the 'height' are present, the graphic is divided by the 'height', the divided graphic and the right-angled triangle are joined together to form a trapezoid. Rectangles whose optional sides are equal to each other in length are joined together to form a rectangle.
Inventors:
Yuuichi Kawase
Application Number:
JP16857893A
Publication Date:
August 06, 2001
Filing Date:
June 15, 1993
Export Citation:
Assignee:
JEOL Ltd.
International Classes:
H01L21/027; (IPC1-7): H01L21/027
Domestic Patent References:
| JP5198486A |