Title:
EUV exposure equipment
Document Type and Number:
Japanese Patent JP6303399
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide an EUV exposure device in which the planarity of an EUV mask does not degrade even if a foreign matter exists on the surface of an electrostatic chuck of the EUV exposure device and on the surface of a conductive film of the EUV mask, when they are attracted electrostatically, no defect occurs therein to cause deterioration, and the surface of an electrostatic chuck always free from a foreign matter can be reproduced even if attachment and detachment of the EUV mask is repeated and a foreign matter is brought onto the surface of the electrostatic chuck.SOLUTION: In an EUV exposure device having an electrostatic chuck 11 performing electrostatic attraction of a conductive film 13 formed on the surface of an EUV mask 17 on the side opposite to the surface where a multilayer reflection film 15 is formed, a protective coat 12 composed of a flexible material capable of taking in a foreign matter adhering to the surface of the electrostatic chuck is provided on the surface of electrostatic chuck.
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Inventors:
Yousuke Kojima
Application Number:
JP2013223115A
Publication Date:
April 04, 2018
Filing Date:
October 28, 2013
Export Citation:
Assignee:
Toppan Printing Co., Ltd.
International Classes:
G03F7/20; B08B7/00; H01L21/304
Domestic Patent References:
| JP2008226887A | ||||
| JP6198533A | ||||
| JP2012009537A | ||||
| JP2012182235A | ||||
| JP2005228978A | ||||
| JP2008032884A | ||||
| JP60111038U | ||||
| JP2007227499A | ||||
| JP2012033569A | ||||
| JP2011134929A | ||||
| JP2009117441A |
Foreign References:
| WO2010087345A1 | ||||
| US20110266140 | ||||
| US20050087939 | ||||
| WO2012005294A1 |
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