Title:
EUV lithography system
Document Type and Number:
Japanese Patent JP6214042
Kind Code:
B2
Abstract:
In this case, each of a plurality of the mirror elements generates an image of the monitor radiation source in an image plane assigned to the respective mirror elements, distances B between the image planes assigned to the mirror elements and the screen have a maximum distance, distances A between each of the plurality of mirror elements and the image plane assigned to it have a minimum distance, and the maximum distance B is less than half of the minimum distance A.
Inventors:
Dinger Udo
Vishmeier Lars
Hauf marx
Kellner Stephan
Grewig Igor
Degunter Marx
Vishmeier Lars
Hauf marx
Kellner Stephan
Grewig Igor
Degunter Marx
Application Number:
JP2013542413A
Publication Date:
October 18, 2017
Filing Date:
December 09, 2011
Export Citation:
Assignee:
Carl Zeiss SGM Gaehha
International Classes:
G03F7/20; G02B19/00
Domestic Patent References:
| JP2008091907A | ||||
| JP2010518595A | ||||
| JP2007139773A | ||||
| JP2006208380A | ||||
| JP2004085955A | ||||
| JP2009117671A | ||||
| JP2008085326A | ||||
| JP2010141071A |
Foreign References:
| WO2010102649A1 |
Attorney, Agent or Firm:
Koichi Tsujii
Sadao Kumakura
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Hiroshi Uesugi
Yoshinori Kishi
Sadao Kumakura
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Hiroshi Uesugi
Yoshinori Kishi
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