Title:
ＥＵＶ用ペリクルフレーム、ペリクル、ペリクル付露光原版、露光方法、及び半導体の製造方法
Document Type and Number:
Japanese Patent JP7357432
Kind Code:
B2
Abstract:
The present invention is to provide a pellicle frame in a frame shape having an upper end face on which a pellicle film is to be arranged and a lower end face to face a photomask, which is characterized by being provided with a notched part from the outer side face toward inner side face of the lower end face; a pellicle including the pellicle frame as an element; and a method for peeling a pellicle from a photomask onto which the pellicle has been attached, which is characterized by inserting a peeling jig into a notched part from a side face of a pellicle frame, and moving the peeling jig in an upper end face direction of the pellicle frame in this state to peel off the pellicle from the photomask.
Inventors:
Yu Yanase
Application Number:
JP2017196982A
Publication Date:
October 06, 2023
Filing Date:
October 10, 2017
Export Citation:
Assignee:
Shin-Etsu Chemical Co., Ltd.
International Classes:
G03F1/64; G03F1/62; H01L21/673
Domestic Patent References:
| JP201783791A | ||||
| JP2000292909A | ||||
| JP201518228A |
Foreign References:
| WO2008105531A1 | ||||
| WO2016043292A1 | ||||
| WO2016043301A1 | ||||
| US20130089814 | ||||
| WO2007094197A1 |
Attorney, Agent or Firm:
Patent Attorney Corporation Eimei International Patent Office