To stabilize filter characteristics and improve the reliability in an elastic wave device.
An elastic wave device includes a piezoelectric substrate 10, a comb-shaped electrode 12 formed on the piezoelectric substrate 10, and an insulative film 16 formed on a surface of the comb-shaped electrode 12 by using Atomic Layer Deposition (ALD) method and including aluminum oxide. A manufacturing method of the elastic wave device includes a process where the comb-shaped electrode 12 is formed on the piezoelectric substrate 10 and a process where the insulative film 16 including aluminum oxide is formed on the surface of the comb-shaped electrode 12 by using ALD method. The insulative film 16 is formed by ALD method, thereby stabilizing filter characteristics and improving the reliability.
JPH07212177 | SURFACE WAVE FILTER |
JP5182437 | Elastic wave device and its manufacturing method |
JPH039609 | SURFACE ACOUSTIC WAVE FILTER |
JP2006165537A | 2006-06-22 | |||
JP2007312201A | 2007-11-29 | |||
JP2009188844A | 2009-08-20 | |||
JP2007336417A | 2007-12-27 | |||
JP2002135075A | 2002-05-10 |
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