Title:
ELECTRODE FOR EMISSION OF ELECTRON, AND ITS MANUFACTURE, AND FLUORESCENT TUBE USING IT
Document Type and Number:
Japanese Patent JP3107743
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To suppress the sputtering by discharge besides being able to lower the discharge voltage, in a cold cathode fluorescent tube, etc.
SOLUTION: In electrode substrate cleaning process 1, electrode substrate consisting of Ni-Cr material or nickel is cleaned. Next, in film formation process 2 for formation of an electron emitting film, an yttrium films is grown on the surface of the electrode substrate. Next, in oxidation process 3, an oxide yttrium oxide (Y2O3-z, 0≤z≤1.0) film is made on the surface of the electrode substrate by heating it in hydrogen atmosphere 1vol.% or under in content percentage of oxygen or oxygen-containing substance. Using the electrode for electron emission manufactured this way for a cold cathode fluorescent tube, etc., will be able to lower the discharge voltage and suppress the sputtering by discharge.
Inventors:
Osamu Nakamura
Shigeo Suzuki
Shigeo Suzuki
Application Number:
JP10200596A
Publication Date:
November 13, 2000
Filing Date:
April 02, 1996
Export Citation:
Assignee:
CASIO COMPUTER CO.,LTD.
Stanley Electric Co., Ltd.
Stanley Electric Co., Ltd.
International Classes:
H01J61/06; H01J1/30; H01J1/304; H01J9/02; H01J17/06; H01J31/12; H01J61/067; G02F1/13357; (IPC1-7): H01J9/02; H01J1/30; H01J17/06; H01J31/12; H01J61/06
Domestic Patent References:
JP4104430A |
Attorney, Agent or Firm:
Jiro Sugimura
Previous Patent: 延長型催涙スプレー
Next Patent: NONDISPERSION-TYPE INFRARED GAS ANALYSIS SYSTEM AND DEVICE THEREFOR
Next Patent: NONDISPERSION-TYPE INFRARED GAS ANALYSIS SYSTEM AND DEVICE THEREFOR