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Patent Searching and Data


Title:
レーザ発生されたプラズマを使用する電磁放射発生
Document Type and Number:
Japanese Patent JP2004507873
Kind Code:
A
Abstract:
An extreme ultraviolet radiation generator is disclosed in which Xenon gas is continuously ejected from a high pressure nozzle into a low pressure chamber to generate Xenon atom clusters which are irradiated with a high repetition rate pulsed laser to form a plasma and yield quasi-continuous EUV generation. The nozzle has a beveled outer rim to enable the focus point of the laser light to be brought close to the nozzle. The nozzle is cooled to a temperature at which background Xenon gas condenses onto the nozzle forming a protective layer. A gas compressor serves to recirculate the Xenon gas and batch purification triggered by a mass spectrometer monitoring gas purity may be periodically applied.

Inventors:
Taylor, Alan Gee
Crag, David Earl
Mercer, Ian Pee
Allwood, Daniel A
Application Number:
JP2002522474A
Publication Date:
March 11, 2004
Filing Date:
August 30, 2001
Export Citation:
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Assignee:
Power Rays Limited
International Classes:
G21K5/00; G03F7/20; G21K5/02; G21K5/08; H01L21/027; H05G2/00; H05H1/24; (IPC1-7): H05G2/00; G03F7/20; G21K5/00; G21K5/02; G21K5/08; H01L21/027; H05H1/24
Domestic Patent References:
JPH05258692A1993-10-08
JPH07232290A1995-09-05
Foreign References:
WO1999051356A11999-10-14
WO1998034234A11998-08-06
WO1997040650A11997-10-30
WO1999063790A11999-12-09
Attorney, Agent or Firm:
Takehiko Suzue
Satoshi Kono
Makoto Nakamura
Kurata Masatoshi
Takashi Mine
Yoshihiro Fukuhara
Sadao Muramatsu
Ryo Hashimoto