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Patent Searching and Data


Title:
ELECTRON BEAM APPARATUS
Document Type and Number:
Japanese Patent JPS61220259
Kind Code:
A
Abstract:

PURPOSE: To improve the accuracy by correcting deflection of secondary electrons due to the deflection of electron beam in an electron beam apparatus having an energy analyzer for detecting the potential of specimen comprising a take-out electrode, a deceleration electrode, a deflector, etc. arranged for an objective lens.

CONSTITUTION: The secondary electrons emitted from a specimen 4 are passed through a take-out electrode 8 and a deceleration electrode 9 arranged for an objective lens 3 then detected through a detector 7. Here, deflection signals (x), (y) are fed through drivers 11, 12 to a deflector 5 while to the amplifiers 13, 14 to be amplified. Then predetermined constant voltage is added through adder/amplifiers 15, 16 to provide (x) and (y) signals to repspective grid 7a of a pair of detectors 7 arranged while crossing perpendicularly with the advancing axis of electron beam then the outputs are amplified through an amplifier 17 and fed to a CRT. Consequently, the deflection of secondary electrons caused through deflection of electron beam can be correct resulting in highly accurate potential measurement.


Inventors:
ITO AKIO
OKUBO KAZUO
GOTO YOSHIAKI
ISHIZUKA TOSHIHIRO
OZAKI KAZUYUKI
Application Number:
JP6123885A
Publication Date:
September 30, 1986
Filing Date:
March 26, 1985
Export Citation:
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Assignee:
FUJITSU LTD
International Classes:
G01R31/302; H01J37/244; H01J37/28; H01L21/66; H01L21/30; (IPC1-7): H01J37/28; H01L21/30
Attorney, Agent or Firm:
Sadaichi Igita