Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
ELECTRON BEAM BOMBARDMENT TYPE EVAPORATION SOURCE
Document Type and Number:
Japanese Patent JP2002371353
Kind Code:
A
Abstract:

To obtain an evaporation source which has superior heat responsibility on heating and cooling, gives no molecular damage to vaporizing materials 2, and hence is most suitable for a manufacturing process of an organic electroluminescent element by means of laminating films of organic polymer materials, through sequentially evaporating the several vaporizing materials 2 and depositing them on a substrate 17.

The electron beam bombardment type evaporation source has a crucible 1 which accommodates an vaporizing material 2, and a heating means for heating and evaporating the vaporizing material 2 in the crucible 1. The evaporation source comprises making the crucible 1 from a refractory metal such as molybdenum and tantalum, a filament 5 which generates thermoelectrons by a heating means, and a power source 22 for accelerating the thermoelectrons generated at the filament 5 and bombarding them to the above crucible 1.


Inventors:
TAKAHASHI HIROSHI
Application Number:
JP2001179773A
Publication Date:
December 26, 2002
Filing Date:
June 14, 2001
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
EIKO ENGINEERING CO LTD
International Classes:
C23C14/30; (IPC1-7): C23C14/30
Attorney, Agent or Firm:
Kazuyoshi Hojo