To provide an electron beam control device which is capable of preventing an electron beam used for an electron beam exposure unit used for drawing patterns from varying in irradiation density with a change in location.

The electron beam control device is equipped with an electron gun which emits an electron beam, and a reflected electron beam detector which detects an electron beam reflected from a specimen provided with a prescribed pattern so as to evaluate a reflected electron beam and to control an electron beam. The electron beam control device is equipped with a selecting means which selects one or more parameters that specify a curve to approximate by the curve waveforms that represent the strength of the reflected electron beam, and a modifying means which modifies, at least, either the irradiation conditions or the reflection conditions of the electron beam.