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Patent Searching and Data


Title:
ELECTRON BEAM DRAWING APPARATUS
Document Type and Number:
Japanese Patent JP2003309062
Kind Code:
A
Abstract:

To solve the problem that desired position accuracy cannot be obtained due to the variations in the temperature of an apparatus and a sample before and during drawing.

No drawing is made until the temperature in the apparatus becomes a fixed one before the drawing, and a sample stage is moved at a fixed speed during the drawing, thus reducing the influence due to heat before and during the drawing, and hence precisely drawing a circuit pattern to the sample.


Inventors:
KADOWAKI YASUHIRO
MIZUNO ICHII
SHIMADA HAJIME
Application Number:
JP2002115773A
Publication Date:
October 31, 2003
Filing Date:
April 18, 2002
Export Citation:
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Assignee:
HITACHI HIGH TECH CORP
International Classes:
G03F7/20; H01J37/20; H01L21/027; (IPC1-7): H01L21/027; G03F7/20; H01J37/20
Attorney, Agent or Firm:
Katsuo Ogawa (1 person outside)