ELECTRON BEAM DRAWING APPARATUS - HITACHI HIGH TECH CORP

Title:

ELECTRON BEAM DRAWING APPARATUS

Document Type and Number:

Japanese Patent JP2003309062

Kind Code:

A

Abstract:

To solve the problem that desired position accuracy cannot be obtained due to the variations in the temperature of an apparatus and a sample before and during drawing.

No drawing is made until the temperature in the apparatus becomes a fixed one before the drawing, and a sample stage is moved at a fixed speed during the drawing, thus reducing the influence due to heat before and during the drawing, and hence precisely drawing a circuit pattern to the sample.

Inventors:

KADOWAKI YASUHIRO
MIZUNO ICHII
SHIMADA HAJIME

Application Number:

JP2002115773A

Publication Date:

October 31, 2003

Filing Date:

April 18, 2002

Export Citation:

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Assignee:

HITACHI HIGH TECH CORP

International Classes:

G03F7/20; H01J37/20; H01L21/027; (IPC1-7): H01L21/027; G03F7/20; H01J37/20

Attorney, Agent or Firm:

Katsuo Ogawa (1 person outside)

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