Title:
ELECTRON BEAM EMITTING DEVICE
Document Type and Number:
Japanese Patent JP3268741
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To irradiate the side surface or lower surface of a matter to be irradiated with a device with compact and simple structure by arranging a reflecting means for reflecting electron beam aside or below the matter to be irradiated.
SOLUTION: When an electron beam 24 is emitted to a matter to be irradiated 10 arranged within an electron beam emitting device 20 from the upper part by an electron gun 22, a pair of reflecting devices 40a, 40b are provided obliquely under the matter to be irradiated 10. Cooling pipes are arranged on the reverse side of reflecting blocks constituting the reflecting devices 40a, 40b to prevent the deformation by a temperature rise caused by electron beam emission. The reflecting block is provided with a position regulating mechanism for regulating the lateral position and an angle regulating mechanism for regulating the angle so as to be adjustable to an optimum position or angle according to the form or size of the matter to be irradiated 10 or the emission energy of electron beam. The reflecting surface may have a convex or flat form in addition to concave form, and two flat reflecting plates further may be hinged so that the form of the reflecting form is changeable.
Inventors:
Hiroki Suezawa
Application Number:
JP22942397A
Publication Date:
March 25, 2002
Filing Date:
August 26, 1997
Export Citation:
Assignee:
Sumitomo Heavy Industries Ltd.
International Classes:
G21K5/04; H01J33/00; (IPC1-7): G21K5/04; H01J33/00
Domestic Patent References:
| JP261600A | ||||
| JP4510680B1 |
Attorney, Agent or Firm:
Satoshi Takaya (2 outside)