Title:
電子ビーム露光装置
Document Type and Number:
Japanese Patent JP5037850
Kind Code:
B2
Abstract:
The device has an electron gun (101) for producing an electron beam, a deflector for diffracting the beam, and a semiconductor wafer platform, on which a semiconductor wafer is placed. A platform position detector finds the position of the platform. A platform position computing unit for computing the motion speed of the platform, based on a distance over which the platform moves and on a time required to move the platform over the distance. A deviation control initiates the deflector, and deviates the beam based on the deviation amount of the beam. The computing unit is also provided for computing the amount of position change of the platform with respect to an interpolation time.
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Inventors:
Takamasa Sato
Yoshihisa Oo
Yoshihisa Oo
Application Number:
JP2006125312A
Publication Date:
October 03, 2012
Filing Date:
April 28, 2006
Export Citation:
Assignee:
Advantest Corporation
International Classes:
H01L21/027; G03F7/20; H01J37/305
Domestic Patent References:
| JP2004146402A | ||||
| JP2000182938A |
Attorney, Agent or Firm:
Keizo Okamoto