Title:
ELECTRON BEAM EXPOSURE DEVICE
Document Type and Number:
Japanese Patent JPS57190318
Kind Code:
A
Abstract:
PURPOSE:To contrive the improvement of workability and quality, by equipping a thermosensor and heating device in a reserve chamber of electron beam exposure with a sensor and controller for heating provided in the outside of the chamber. CONSTITUTION:A cassette 1 with a wafer or mask 7 suppressed 8 by a reference surface 13 built-in is settled in the reserve chamber 3 via a retaining device 2. When the chamber 3 is evacuated by a pump 4, the adiabatic expansion of gas decreases the temperature in the chamber followed by the decrease of the temperature of the cassette 1 and retaining device 2. This is detected by the sensor 5 for control 9 with the heating device 6 built in a retainer 2 control-driven 10. Therefore, the cassette 1 can be recovered to a fixed temperature in a short time and maintained so that the work is accelerated without strain due to the temperature recovery of th cassette 1 and mask or wafer 7 during exposure to improve the quality.
Inventors:
NINOMIYA MASAHARU
Application Number:
JP7539081A
Publication Date:
November 22, 1982
Filing Date:
May 19, 1981
Export Citation:
Assignee:
TOSHIBA MACHINE CO LTD
International Classes:
G03F7/20; H01J37/317; H01L21/027; (IPC1-7): G03F7/20