Title:
電子ビーム露光装置及び電子レンズ
Document Type and Number:
Japanese Patent JP4301724
Kind Code:
B2
Abstract:
An electron beam exposure system for exposing a pattern on a wafer using a plurality of electron beams, comprising a section for generating a plurality of electron beams, an electron lens section having a plurality of apertures for passing a plurality of electron beams and focusing the plurality of electron beams independently, and a magnetic field formation section provided at least one of the plurality of apertures and forming a magnetic field in a direction substantially perpendicular to the irradiating direction of an electron beam passing through the aperture.
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Inventors:
Takeshi Haraguchi
Application Number:
JP2000371638A
Publication Date:
July 22, 2009
Filing Date:
December 06, 2000
Export Citation:
Assignee:
Advantest Corporation
International Classes:
G03F7/20; H01L21/027; H01J37/141; H01J37/147; H01J37/305; H01J37/317
Domestic Patent References:
| JP61003098A | ||||
| JP59160947A | ||||
| JP52060563A | ||||
| JP9246035A | ||||
| JP10079346A | ||||
| JP11354063A |
Attorney, Agent or Firm:
Akihiro Ryuka