Title:
電子ビーム・イオン発生装置および電子ビーム・イオン発生方法
Document Type and Number:
Japanese Patent JP7253647
Kind Code:
B2
Abstract:
PURPOSE: To provide an electron beam ion generation device and an electron beam ion generation method that irradiate gas with an electron beam to generate ions.CONSTITUTION: An electron beam ion generation device includes an electron-generating element that is excited by irradiating with light to generate electrons, a voltage-applied accelerating electrode that accelerates the generated electrons, and an ion generation device provided with ion generating means that collides accelerated electrons with gas to generate positive and negative ions and capturing means that captures electrons that have passed without collision.SELECTED DRAWING: Figure 1
Inventors:
Keizo Yamada
Application Number:
JP2022031150A
Publication Date:
April 06, 2023
Filing Date:
March 01, 2022
Export Citation:
Assignee:
Holon Co., Ltd.
International Classes:
H01J27/20; H01J37/20; H01J37/28
Domestic Patent References:
| JP2010262930A | ||||
| JP3504653A | ||||
| JP2018181790A |
Foreign References:
| US20150162178 |
Attorney, Agent or Firm:
Morihiro Okada