Electron beam irradiation equipment, multi-electron beam irradiation equipment, electronic beam exposure equipment, and an electron beam irradiation method

Title:

Electron beam irradiation equipment, multi-electron beam irradiation equipment, electronic beam exposure equipment, and an electron beam irradiation method

Document Type and Number:

Japanese Patent JP6018386

Kind Code:

B2

Abstract:

PROBLEM TO BE SOLVED: To provide a compact electron beam irradiation device in which throughput of an electron beam exposure device is enhanced.SOLUTION: The electron beam irradiation device outputing a plurality of electron beams includes a surface electron beam source having a plurality of electron emission parts which focuses electrons emitted, respectively, from the plurality of electron emission parts while accelerating and outputs as a plurality of electron beams, and an electron lens for irradiating an object with a drawing pattern formed of the plurality of electron beams output from the surface electron beam source with a predetermined magnification.

Inventors:

Masayoshi Esashi
Naokatsu Ikegami
Akira Kojima

Application Number:

JP2012027499A

Publication Date:

November 02, 2016

Filing Date:

February 10, 2012

Export Citation:

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