Title:
Electron beam processing system
Document Type and Number:
Japanese Patent JP6293956
Kind Code:
B2
Abstract:
The disclosure relates to an electronic beam machining system. The system includes a vacuum chamber; an electron gun located in the vacuum chamber and used to emit electron beam; a holder located in the vacuum chamber and used to fix an object; a control computer; and a diffraction unit located in the vacuum chamber; the diffraction unit includes a two-dimensional nanomaterial; the electron beam transmits the two-dimensional nanomaterial to form a transmission electron beam and a plurality of diffraction electron beams; the transmission electron beam and the plurality of diffraction electron beams radiate the object to form a transmission spot and a plurality of diffraction spots.
Inventors:
Willow Peng
Zhao Wei
Hayashi Xiaoyang
Ryo Shudan
Zhang Harumi
Ginger
Han Moriyoshi
Zhao Wei
Hayashi Xiaoyang
Ryo Shudan
Zhang Harumi
Ginger
Han Moriyoshi
Application Number:
JP2017112813A
Publication Date:
March 14, 2018
Filing Date:
June 07, 2017
Export Citation:
Assignee:
Tsinghwa University
HON HAI PRECISION INDUSTRY CO.,LTD.
HON HAI PRECISION INDUSTRY CO.,LTD.
International Classes:
H01J37/305; B23K15/00; H01J37/04; H01L21/027
Domestic Patent References:
| JP2014515695A | ||||
| JP201514613A | ||||
| JP2006245096A | ||||
| JP2015107913A |
Attorney, Agent or Firm:
try international patent corporation