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Title:
ELECTRON BEAM TREATMENT DEVICE
Document Type and Number:
Japanese Patent JP2002182000
Kind Code:
A
Abstract:

To provide an electron beam treatment device which can treat the whole treatment area of an object to be treated in a lump even if the object is not moved by allowing electron beams to be applied from electron beam tubes to overlap well with each other to make a prescribed condition of a distribution of the absorbed dose in the whole treatment area of the object.

In the electron beam treatment device in this invention, the electron beam tubes 1 are located so that electron beam emitting windows 15 can be exposed in a treatment room 2 for treating the object W. The electron beam treatment device is characterized in that each of the electron beam tubes 1 is located so as to make a prescribed condition of a distribution of the absorbed dose in the whole treatment area of the object W.


Inventors:
YAMAGUCHI MASANORI
Application Number:
JP2000379679A
Publication Date:
June 26, 2002
Filing Date:
December 14, 2000
Export Citation:
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Assignee:
USHIO ELECTRIC INC
International Classes:
G21K5/04; B01J19/12; B23K15/00; B29C35/08; C23C14/30; G21K5/00; H01J33/04; H01J37/30; H01L21/31; (IPC1-7): G21K5/04; B01J19/12; B23K15/00; C23C14/30; G21K5/00; H01L21/31